Presentation Information

1:40 PM - 2:00 PM JST(4:40 AM - 5:00 AM UTC)Japanese

[C442-1pm-03]Evaluation of Atomic Oxygen Resistance of alkyl-POSS film

○Kazuki Yukumatsu^1,2, Soichi Yokoyama², Aki Goto¹, Mikito Maruyama², Yugo Kimoto¹, Yutaka Ie² (1. Japan Aerospace Exploration Agency, 2. SANKEN, Osaka University)

Download PDF

Keywords:

Atomic Oxygen,Polyhedral oligomeric silsesquioxane

Back to Session information