[C442-3am] 20. Materials Chemistry -Basic and Application-

10:50 AM - 11:00 AM JST(1:50 AM - 2:00 AM UTC)Japanese

[C442-3am-03] Design of anisotropically mechanical polymer films by patterned photopolymerization of isotropic monomers

○Kyosuke Misaki¹, Yusho Kishimoto¹, Kyohei Hisano¹, Atsushi Shishido¹ (1. Tokyo Institute of Technology)

Keywords:

Photopolymerization,Flexible device,Film,Tensile test,Mechanical function