Presentation Information

10:20 AM - 10:30 AM JST(1:20 AM - 1:30 AM UTC)Japanese

[D342-2am-08]Hierarchical Macro-/Microphase-Separated Structure Formation via Controlled UV curing Using Polymer Domant with C-I Endgroups

○Honoka FUMOTO¹, Shuhei ABE¹, Ayane MOCHIZUKI¹, Kenichi OYAIZU¹, Takeo SUGA¹ (1. Waseda University, School of Advanced Science and Engineering)

Controlled Radical Polymerization,Photo-curing,Polymeric Dormant,Microphase Separation