Presentation Information

[TuA2-01 Invited]Development of High-Performance P-type Semiconductors for Transistors

〇Wonryeol Yang1 (1. Pohang Univ. of Sci. and Tech. (POSTECH) (Korea))
Developing high-mobility p-type semiconductors that are compatible with low-temperature, silicon-processable routes remains a key challenge for integrating complementary electronics with mature n-type technologies. This presentation summarizes our recent progress in Sn2+ halide perovskite p-type thin-film transistors (TFTs). Solution-processed CsSnI3-based devices exhibit field-effect hole mobilities exceeding 50 cm2 V-1 s-1 with current modulation ratios above 108 and robust operational stability. A triple A-cation approach (Cs–FA–PEA) further enables high-quality cascaded channel films, delivering record mobilities over 70 cm2 V-1 s-1 and on/off ratios >108, approaching the performance of commercial low-temperature polysilicon. Finally, we introduce thermally evaporated CsSnI3 TFTs employing PbCl2 as a hole-suppressing and crystallization-promoting additive, achieving >40 cm2 V-1 s-1 mobility and scalable, large-area fabrication via an industry-compatible process.

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