Presentation Information

[TuP3H-01]In-situ Impedance Spectroscopy for Tracking Thermal Surfactant Removal from semiconducting SWCNT Thin Films

〇Kyohei Shiota1, Shinya Kawano1, Yoshiki Hidaka1, Yuki Kuwahara2, Takeshi Saito2, Kenichi Goushi1, Kenji Ishida1 (1. Kyushu Univ. (Japan), 2. Natl. Inst. Adv. Indus. Sci. Tech. (Japan))
Semiconducting single-walled carbon nanotubes (s-SWCNTs) are attracting increasing attention as next-generation semiconductor materials for flexible electronics. When fabricating s-SWCNT thin films via environmentally friendly aqueous processes, the addition of surfactants is required to prepare stable aqueous inks. However, residual surfactants remaining in the deposited thin films adversely affect the electrical properties of the s-SWCNTs by increasing contact resistance and impeding charge transport. In this study, in-situ impedance spectroscopy measurements were performed on s-SWCNT thin films during thermal treatment under vacuum. The thermal treatment resulted in a decrease in the impedance magnitude |Z|, indicating that thermal treatment under vacuum effectively removes surfactants from the thin films. This in-situ monitoring approach enables real-time evaluation of the surfactant removal process and optimization of fabrication condition for s-SWCNT-based flexible electronics.

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