[P] Poster Session

5:30 PM - 7:30 PM JST(8:30 AM - 10:30 AM UTC)

[P-068] Suspended Silicon Nitride (Si₃N₄) Resonators Using XeF₂ Dry Etching

*Awse Salha¹, Alexandre Barbosa¹, Pritwish Agarwal¹, Kazuki Bessho¹, Nils Johan Engelsen¹ (1. Chalmers University of Technology (Sweden))