Presentation Information
[MD-1-02]Novel surface passivation technique for GeSn alloy using GeO2 atomic layer deposition
*Yoshiki Kato1, Mitsuo Sakashita1, Masashi Kurosawa1, Osamu Nakatsuka1,2, Shigehisa Shibayama1 (1. Grad. Sch. Eng., Nagoya Univ., 2. IMaSS., Nagoya Univ.)
