Presentation Information
[NC-P-1-05]Study on Si-Nanosheet Formation from Si0.7Ge0.3/Si/Si0.7Ge0.3 Stacked Layers with CF4/H2 Plasma
*Kotaro Ozaki1, Yusuke Imai1, Takayoshi Tsutsumi2, Yuki Imai1, Kenji Ishikawa2, Yuji Yamamoto3,1, Wei-Chen Wen3, Katsunori Makihara1,3 (1. Graduate School of Engineering, Nagoya University, 2. Center for Low-temperature Plasma Sciences, Nagoya University, 3. IHP-Leibniz-Institut für Innovative Mikroelektronik)