Poster Session 1

2:00 PM - 4:45 PM JST(5:00 AM - 7:45 AM UTC)

[32068] Copper (II) chloride increases low-temperature plasma-induced oxidative stress

*Yasumasa Okazaki¹, Jun Yoshitake², Hiromasa Tanaka^3,4, Masaru Hori³, Takahiro Shibata^2,5, Shinya Toyokuni^1,3 (1. Nagoya University Graduate School of Medicine (Japan), 2. Nagoya University Institute of Nano-Life-System, Institutes of Innovation for Future Society (Japan), 3. Nagoya University Center for Low-temperature Plasma Sciences (Japan), 4. Nagoya University Graduate School of Medicine Center for Advanced Medicine and Clinical Research (Japan), 5. Nagoya University Graduate School of Agricultural and Life Sciences Laboratory of Food and Biodynamics (Japan))