[Th-P] Emerging Materials and Nanoscale Devices

[Th-P-56] First-principles study of dielectric function of stressed silicon thin films

〇Toshiaki Hayashi¹, Yasushi Shinohara¹, Hiroyuki Kageshima², Jinichiro Noborisaka¹, Katsuhiko Nishiguchi³, Gento Yamahata¹ (1. Basic Res. Lab., NTT, Inc. (Japan), 2. Shimane Univ. (Japan), 3. Yokohama National Univ. (Japan))

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