Presentation Information
[Th-P1-E-02]Surface State Dominated Transport in HgTe Topological Insulator Devices
〇Maximilian Hofer1,2, Christopher Fuchs1,2, Lena Fürst1,2, Tobias Kießling1,2, Wouter Beugeling1,2, Steffen Schreyeck1,2, Hartmut Buhmann1,2, Laurens W. Molenkamp1,2 (1. Inst. for Topological Insulators, Univ. of Würzburg (Germany), 2. Inst. of Physics (EP3), Univ. of Würzburg (Germany))
We study strained HgTe films (26–110 nm) showing surface-state dominated transport. Experimental results quantitatively agree with eight-orbital k·p theory. We map the parameter regimes for topological surface versus bulk-mediated transport as a function of layer thickness and carrier density.
