Presentation Information
[4]Suppressing Fluorine Residue via Optimized CVD Chamber Cleaning to Enhance EL/CVD Interfacial Reliability for OLED Thin-Film Encapsulation
*Fei Qi1, Jing Ni1, Yu Gu1, Xiaoguang Zhu1, Cao Dai1, Juncheng Xiao1 (1. Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. (China))
Keywords:
TFE,EL/CVD interface,fluorine residue,Interfacial Adhesion
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