Presentation Information

[5]Study on the Mechanism and Improvement of Large-Size Peripheral Mura

*Guang Jia Wang1, Bing Li2, Ying Jie Wang2, Xin Lin2, Hai Shuang Jia2, Hong Yan Chang2, Shi Shuai Huang2, Bing Han2, Paul Shi1, Wade Chen1 (1. Changsha HKC Optoelectronics Co., Ltd. (China), 2. Chuzhou HKC Optoelectronics Technology Co. Ltd. (China))

Keywords:

peripheral Mura,seesaw effect,cell gap deviation,seal support,LC pattern optimization


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