Presentation Information
[04P-28]Optimizing Plasma Etching Processes by Elucidating C3HF5 Primary Dissociation Mechanisms
*NGUYEN TRUNG TRAN1, Hiroshi Iwayama2, Toshio Hayashi 1, Kenji Ishikawa1 (1. Center for Low-temperature Plasma Science, Nagoya University (Japan), 2. UVSOR Synchrotron Facility (Japan))