Poster Session 1

4:00 PM - 5:30 PM JST(7:00 AM - 8:30 AM UTC)

[04P-12] Effects of Substrate Bias on Deposition Characteristics of Cumene Plasma Chemical Vapor Deposition Method

*Manato Eri¹, Shinjiro Ono¹, Shumpei Ohara¹, Takamasa Okumura¹, Kunihiro Kamataki¹, Haruki Kiyama¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1. Kyushu University (Japan))