Presentation Information
[04P-34]Aluminum Thin Film Dry Etching using Electron Beam Irradiation for Polysilsesquioxane Nano Pattern as an Etching Mask
*Manabu Yasui1, Yoshitake Nishi1, Daishi Shiojiri1, Masahito Kurouchi1, Satoru Kaneko1, Masahiko Mitsuhashi1 (1. Kanagawa Institute of Industrial Science and Technology (Japan))