Presentation Information
[04P-24]Fabrication of Cubic Boron Nitride Films on WC Substrates Using Electron Beam Excited Plasma CVD Method
*Toru Harigai1, Seigo Takashima1, Kenichi Inoue2, HIroyuki Kousaka1, Kenji Ishikawa2, Masaru Hori2 (1. Gifu University (Japan), 2. Nagoya University (Japan))