Presentation Information
[04P-35]Low-Damage Plasma Etching of Metal Gate TiAlC Using Nonhalogen Chemistries at Room Temperature
*Thi-Thuy-Nga Nguyen1, Kazunori Shinoda2, Shih-Nan Hsiao1, Kenji Maeda2, Kenetsu Yokogawa2, Masaru Izawa2, Kenji Ishikawa1, Masaru Hori 1 (1. Nagoya University (Japan), 2. Hitachi High-Tech Corp. (Japan))