Presentation Information
[05P-22]Effect of External Circuit Impedance and Process Condition in a Capacitively Coupled VHF Plasma
*Sang-Hyeok Park1, Yonghyun Kim1, Dae-Chul Kim1, Jongsik Kim1 (1. Data Research Team, Institute of Plasma Technology, Plasma E.I. Convergence Research Center, Korea Institute of Fusion Energy (Korea))