Presentation Information
[05P-71]Impact of Deposition Rate on Spatial Homogeneity of High-Sn-Content Ge1−XSnX (X~0.25) Epitaxial Layers in Sputtering Method
*Shigehisa Shibayama1, Taichi Kabeya1, Mitsuo Sakashita1, Masashi Kurosawa1, Osamu Nakatsuka1,2 (1. Nagoya University (Japan), 2. IMaSS, Nagoya University (Japan))