Presentation Information
[04P-02]Plasma-Enhanced Atomic Layer Deposition of AlN/TiN Nano-laminate as a Mechanically Robust Electronic Material
Guan-Rong Lin1, Jhe-Wei Yeh1, Chao-Yung Chen1, *Pak-Man Yiu1,2 (1. Department of Materials Engineering, Ming Chi University of Technology (Taiwan), 2. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology (Taiwan))