Presentation Information
[04P-07]Plasma etching resistance of gas flow sputter prepared SiC coating under cryogenic CF4/H2 plasma
*Ping-Yen Hsieh1, Chia-Ying Liou1, Shih-Nan Hsiao2, Ying-Hung Chen1, Masaru Hori2, Ju-Liang He1 (1. Feng Chia University (Taiwan), 2. Nagoya University (Japan))