Poster Session-2

[04P-11] Effects of Tetramethylsilane Gas Flow Rate on Si-Containing DLC Films Fabricated Using Gas-Injected Pulsed Plasma CVD Method

*Seigo Makida¹, Toru Harigai², Taketo Nagai¹, Hiroyuki Kosaka^2,3 (1. Graduate School of Natural Science and Technology, Gifu University (Japan), 2. Center for Applied Research of Plasma, Faculty of Engineering, Gifu University (Japan), 3. Department of Mechanical Engineering, Faculty of Engineering, Gifu University (Japan))