[4A02-04] Topical Session | ISPlasma2026/IC-PLANTS2026

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Session Details

Topical Session

Thu. Mar 5, 2026 3:40 PM - 5:10 PM JST
Thu. Mar 5, 2026 6:40 AM - 8:10 AM UTC

Room A(Meijo Hall)

Chair:Mineo Hiramatsu(Meijo University)

Topical Session

3:40 PM - 4:10 PM JST(6:40 AM - 7:10 AM UTC)

[05pA02I]Diamond as the Future Electronic Materials

*Yasuo Koide¹ (1. Meijo University (Japan))

4:10 PM - 4:40 PM JST(7:10 AM - 7:40 AM UTC)

[05pA03I]Defects and stress reduction in junction between single crystal diamond plates : towards large single crystal diamond wafer

*Alix Helene Gicquel^1,2, Basile Perrin², Olivier Duigou², Xavier Glad², Alibi Baïtukha (1. AGL4U (France), 2. Diam Concept (France))

4:40 PM - 5:10 PM JST(7:40 AM - 8:10 AM UTC)

[05pA04I]Advancing Hot-Filament CVD for Scalable and Engineered Diamond Films via Bias-Induced Glow Discharge

*Shinya Ohamagari¹, Mohamed Regab Diab¹, Kazuya Noda¹, Junya Shiraga¹, Taisuke Kageura¹ (1. National Institute of Advanced Industrial Science and Technology (Japan))

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