International Symposium on Sputtering & Plasma Processes (ISSP)

Yen-Chen Liu¹, Yin-Hung Chen^1,2, Shikha Akshay Joshi³, Chao-Kuang Wen¹, Tung-Han Chuang², *Sheng-Chi Chen^1,4, Chih-Ping Chen¹(1. Department of Materials Engineering and Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, Taipei 243, Taiwan, 2. Department of Materials Science and Engineering, National Taiwan University, Taipei 106, Taiwan, 3. Department of Materials Engineering, Indian Institute of Science, Bangalore-560012, India., 4. College of Engineering and Center for Green Technology, Chang Gung University, Taoyuan 333, Taiwan)