[AP1-01](Keynote) Evolution of interconnect metallurgy and future roadmap
*Takeshi Nogami1(1. IBM Research)
International Symposium on Sputtering & Plasma Processes (ISSP2024)
Jul 2 - Jul 5, 2024
You can search for presentations in this event.
SearchInternational Symposium on Sputtering & Plasma Processes (ISSP2024)
Jul 2 - Jul 5, 2024
You can search for presentations in this event.
SearchSearch Results(150)
[AP1-02]Sputter epitaxy of atomically flat Zn1-xMgxO films on sapphire using 3D buffer layers fabricated at high deposition rate
*Hiroki Otsuyama1, Kotaro Yataka1, Takafumi Yunoue1, Naoto Yamashita1, Takamasa Okumura1, Kunihiro Kamataki1, Kazunori Koga1, Masaharu Shiratani1, Naho Itagaki1(1. Graduate School of Information Science and Electrical Engineering, Kyushu University)
[AP1-03]Piezoelectric single-crystal PZT thin films epitaxially grown on Si substrate with oxide buffer layer
*Osamu Nakagawara1(1. I-PEX Piezo Solutions Inc.)
[FS1-01](Invited) Plasma integrated System for 2D Materials
*Hyeong-U Kim1,2(1. Department of Plasma Engineering, Korea Institute of Machinery & Materials (KIMM), 2. Department of Nano-mechanics, University of Science and Technology (UST))
[FS1-02]Metal ion flux fraction increase for industrial applications
*Peter Klein1, Jaroslav Hnilica1, Martin Ondryáš1, Vjačeslav Sochora2, Martin Učík1,3, Ján Klusoň3, Petr Vašina1(1. Masaryk University, Brno, Czech republic, 2. SHM s. r. o., Šumperk, Czech Republic , 3. PLATIT a.s., Šumperk, Czech Republic )
[FS1-03]Non-invasive diagnostics for characterizing conditions at plasma electrode during thin film growth
*Daniel Lundin1, Ulf Helmersson1, Martin Cada2, Zdenek Hubicka2(1. Linköping University, 2. Academy of Science of the Czech Republic)
[TH2-03]Continuous pulse-resolved spectroscopic and electrical plasma monitoring in HIPIMS and pulsed sputtering applications
*Thomas Schütte1, Peter Neiß1, Marius Radloff1, Hokuto Kikuchi1(1. PLASUS GmbH)
[FS1-05]Ion Insights: Optimizing Sputtering and Thin Film Processes for Seamless R&D to Industrial Transition
*Thomas Gilmore1(1. Impedans Ltd.)
[AP2-01](Invited) Metallic nanotube arrays using conformal sputter deposition and photolithography: Fabrication and application
*Jinn P. Chu1(1. National Taiwan University of Science and Technology)
[AP2-02](Invited) Robust Artificial Olfactory Systems by Designing Metal Oxide Nanostructures and Interfaces
*Takeshi Yanagida1,2(1. The University of Tokyo, 2. Kyushu University)
[AP2-03]Reversible control of IMT characteristics of VO2 films through the crystallization and re-amorphization of capping GST layer
*Kunio Okimura1, Takuto Ohnuki1, Yiqi Liu1, Shoya Inagaki2, Yuji Muraoka3, Joe Sakai4, Aiko Narazaki5, Masashi Kuwahara5(1. Tokai University, 2. Faculty of Science, Okayama University, 3. RIIS, Okayama University, 4. Toshima Manufacturing Co. Ltd, 5. National Institute of Advanced Industrial Science and Technology)
[AP2-04]Nanostructured Metal Layers Prepared via Physical Vapor Deposition Techniques for Gas Sensing Applications
*Jan Kejzlar1,2, Martin Hruška1, Přemysl Fitl1, Michal Novotný2, Joris More-Chevalier2, Takayuki Kiba3, Midori Kawamura3, Ján Lančok2, Martin Vrňata1(1. University of Chemistry and Technology, Prague, 2. Institute of Physics of the Czech Academy of Sciences, 3. Kitami Institute of Technology)
[TF1-01](Invited) Recent development of high entropy alloy thin films for sustainable development goals
*Jyh-Wei Lee1(1. Ming Chi University of Technology)
[TF1-02]On the influence of strong- and weak-nitride forming elements on the preparation of refractory metal based high entropy nitrides by magnetron sputtering
Stanislava Debnarova1, Tomasz Stasiak1, Lukas Vrana1, Vilma Bursikova1, Matej Fekete1, Zsolt Czigany2, Katalin Balazsi2, Shuyao Lin3, Nikola Koutna3, Petr Vasina1, *Pavel Soucek1(1. Masaryk University, 2. HUN REN Centre for Energy Research, 3. Technische Universität Wien)
[TF1-03]Effect of bilayer period on the mechanical properties and microstructure of AlCrNbSiTiN/AlCrN high entropy alloy nitride multilayer thin films
*shang hua Tseng1, Jyh-Wei Lee2,5,6,7, Bih-Show Lou3,4, Chaur-Jeng Wang1(1. National Taiwan University of Science and Technology, Taipei, Taiwan, 2. Department of Materials Engineering, Ming Chi University of Technology, New Taipei, Taiwan., 3. Chemistry Division, Center for General Education, Chang Gung University, Taoyuan, Taiwan, 4. Department of Orthopaedic Surgery, New Taipei Municipal TuCheng Hospital, Chang Gung Memorial Hospital, Taiwan, 5. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei, Taiwan, 6. College of Engineering, Chang Gung University, Taoyuan, Taiwan, 7. High Entropy Materials Center, National Tsing Hua University, Hsinchu, Taiwan)
[TF1-04]The simultaneous enhancement of hardness and fracture toughness through superlattice architecture
*Tomas Fiantok1, Marek Vidiš1, Marek Gocník1,2, Peter Jr. Švec3, Štefan Nagy3, Martin Truchlý1, Vitalii Izai1, Tomáš Roch1, Leonid Satrapinskyy1, Viktor Šroba1, Michael Meindlhumer2, Branislav Grančič1, Peter Kúš1, Jozef Keckes2, Marián Mikula1,3(1. Comenius University Bratislava, Slovakia, 2. Montanuniversität Leoben, Austria, 3. Slovak Academy of Sciences, Bratislava, Slovakia)
[TF1-05]Reducing environmental friction with high Performance thin film coating
*Christian Scholz1, Julien Keraudy2, Florian Rovere2(1. Oerlikon Japan Co., Ltd., Hiratsuka, Japan, 2. Oerlikon Surface Solutions AG, Balzers, Liechtenstein.)
[P3-01]Enhanced Performance of p–i–n Perovskite Solar Cells with a Double-Layer Hole Transport Layer
Yen-Chen Liu1, Yin-Hung Chen1,2, Shikha Akshay Joshi3, Chao-Kuang Wen1, Tung-Han Chuang2, *Sheng-Chi Chen1,4, Chih-Ping Chen1(1. Department of Materials Engineering and Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, Taipei 243, Taiwan, 2. Department of Materials Science and Engineering, National Taiwan University, Taipei 106, Taiwan, 3. Department of Materials Engineering, Indian Institute of Science, Bangalore-560012, India., 4. College of Engineering and Center for Green Technology, Chang Gung University, Taoyuan 333, Taiwan)
[P3-02]Electric field control of magnetic anisotropy for Co/graphene/Cu with an artificial canyons
*Cheng-Hsun-Tony Chang1, Yu-Ting Chow2, Pei-Cheng Jiang3, Jyh-Shen Tsay4(1. Department of Electronic Engineering, Minghsin University of Science and Technology, Hsinchu 30401, Taiwan., 2. Department of Electro-Optical Engineering, Minghsin University of Science and Technology, Hsinchu 30401, Taiwan., 3. Department of Mechanical Engineering, Minghsin University of Science and Technology, Hsinchu 30401, Taiwan., 4. Department of Physics, National Taiwan Normal University, Taipei, Taiwan.)
[P3-03]Comprehensive characterization of Al2O3/SiOx/Si passivation layer for photovoltaics using nondestructive XPS and HAXPES techniques coupled with sputter technique
*Pei-Chen Huang1,2,3, Ting-Jia Yang2, Man-Ying Wang1,2,3, Jing-Jong Shyue1,3, Wei-Chun Lin2(1. Department of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan., 2. Department of Photonics, National Sun Yat-sen University, Kaohsiung, Taiwan., 3. Research Center for Applied Sciences, Academia Sinica, Taipei, Taiwan.)
[P3-04]Analog Resistive Switching and Synaptic Behavior of Ni/TiOx/TiOy/TiN Structures for Artificial Intelligence Computing
*Chih-Yi Liu1, Chia-Yu Yang1, Hu-Guan Chiu1, Dong-Han Du1, Zhi-Lin Lee1(1. National Kaohsiung University of Science and Technology)
[P3-05]Artificial Intelligence Identification of Metal Thin Film Quality for Laser-cutting Metal Grid Transparent Conductive Electrodes
*Chin-Chia Kuo1, Yi-Ting Lin2, Wei-Cheng Lien2, Chih-Pien Chen1, Yi-Ting Lai1,3,4(1. Department of Materials Engineering, Ming Chi University of Technology, 2. Hyson Technology Inc, 3. Biochemical Technology R&D Center, Ming Chi University of Technology, 4. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology)
[P3-06]Low temperature growth and characteristics of GaInN films by reactive sputtering
*Qixin GUO1, Koutarou Nonaka1, Katsuhiko Saito1, Tooru Tanaka1(1. Saga University)
[P3-07]Atmospheric pressure gas discharge using back-illuminating photocathode of nano-thick Au film deposited on quartz glass
*Akimitsu Hatta1, Sukma Wahyu Fitriani2, Ryota Oshio1(1. Kochi University of Technology, 2. Kyushu University)
[P3-08]The influence of oxygen addition and post-deposition annealing on nanocrystalline GaN deposited by RF-sputtering
*Yuejie TAN1, Shinsuke Miyajima1(1. Tokyo Institute of Technology)
[P3-09]Electrochemical properties evaluation of FeNiMoWCux high entropy alloy thin films
*Lin Kuan Chen1, Lou Bih Show2,3, Li Chia Lin4, Lee Jyh Wei1,4,5,6(1. Department of Materials Engineering, Ming Chi University of Technology, New Taipei City, Taiwan, 2. Chemistry Division, Center for General Education, Chang Gung University, Taoyuan, Taiwan, 3. Department of Orthopaedic Surgery, New Taipei Municipal TuCheng Hospital, Chang Gung Memorial Hospital, Taiwan, 4. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei, Taiwan, 5. College of Engineering, Chang Gung University, Taoyuan, Taiwan, 6. High Entropy Materials Center, National Tsing Hua University, Hsinchu, Taiwan)
[P3-10]Removal effect of hydrogen plasma arc melting on the mechanical properties of Fe-Ti alloy prepared using Ti scraps
*Jaewon Lim1(1. Jeonbuk National University)
[P3-11]Proposal of a simplified deposition substrate with plasma irradiation function for improving ion irradiation effectiveness in magnetron sputtering with multipolar magnetic plasma confinement.
*Shun Fujihara1, Hiroshi Toyota1(1. Hiroshima Institute of Technology)
[P3-12]Estimation of plasma-induced damage on Si surfaces using the positron annihilation method
*Junichi Yanagisawa1, Ruiji Shigesada1, Masayoshi Ichimiya1, Takahiko Ban1, Atsushi Kinomura2(1. The University of Shiga Prefecture, 2. Kyoto University)
[P3-13]Self-sustained electrical oscillations in VO2-based planar device with facing electrodes triggered by sinusoidal voltage
*Junpei Kidokoro1, Peng Yu1, Kunio Okimura1, Md. Suruzu Mian2, Toshihiro Nakanishi3(1. Graduate School of Engineering, Tokai University, 2. Faculty of Science and Technology, Seikei University, 3. Department of Electronic Science and Engineering, Kyoto University)
[P3-14]Layered structure of VO2 thin films grown on transparent conductive Al-doped ZnO for infrared light switching
*Peng Yu1, Junpei Kidokoro1, Kunio Okimura1, Md. Suruz Mian2, Yosuke Nakata3(1. Graduate School of Engineering, Tokai University, 2. Faculty of Science and Technology, Seikei University, 3. Graduate School of Engineering Science, Osaka University)
[P3-15]Synthesis and Characterization of LLZO thin films using RF sputtering
*Anjali 1, Weon Cheol Lim2, Aditya Sharma3, Moditma1, Sangsul LEE4,5, H J Shin6, Keun Hwa Chae2, Jitendra Pal Singh1(1. Department of Sciences (Physics), Manav Rachna University、2. Advanced Analysis and Data Center, Korea Institute of Science and Technology、3. Department of Physics, University of Petroleum and Energy Studies、4. Pohang Accelerator Laboratory、5. Department of Semiconductor Engineering、6. Department of Physics, Chungbuk National University)
[P3-16]Modifying crystallinity and mechanical properties of TiZrNbTaMo high entropy alloy film by post-annealing treatment
*Chia-Lin Li1, Sen-You Hou2, Jyh-Wei Lee1,3,4,5, Po-Yu Chen2(1. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, 2. Department of Materials Science and Engineering, National Tsing Hua University, 3. Department of Materials Engineering, Ming Chi University of Technology, 4. College of Engineering, Chang Gung University, 5. High Entropy Materials Center, National Tsing Hua University)
[P3-17]Development of Li-doped NiO Thin Films as a Hole Transport Layer for CIGS Solar Cells
*Yosuke Abe1, Takahito Nishimura1, Akira Yamada1(1. Tokyo Institute of Technology)
[P3-18]Sputter deposition of metallic glass coating for low-friction and non-stick applications
*Wei-Jie Wang1, Jinn P Chu1(1. National Taiwan University of Science and Technology)
[P3-19]Preparation of WO3 Thin Films by Vapor Deposition and Wet Coating Methods and Their Application to Dimming Devices
*Ryo Taguchi1, Kazuki Tajima1, Hiroshi Watanabe1, Takashi Kubota1, Haruhisa Akiyama1(1. National Institute of Advanced Science and Technology)
[P3-20]Environmental temperature sputtering by magnetic mirror-type magnetron cathode
*Taisei Motomura1, Kenshin Takemura1, Toshimi Nagase1, Nobutomo Morita1, Wataru Iwasaki1, Naoki Matsuda1, Tatsuo Tabaru1(1. AIST)
[P3-21]Effect of discharge pulse length on GaN thin films by high-density convergent plasma sputtering device
Itsuki Misono1, *Taisei Motomura2, Masato Uehara2, Tatsuo Tabaru2, Tetsuya Okuyama1,3(1. NIT, Kurume College, 2. AIST, 3. Kyushu Univ.)
[P3-23]Low-k Dioxide Layer Synthesized on pristine Si wafer
*Pei-Cheng Jiang1, Yu-Ting Chow2, Cheng-Hsun-Tony Chang3(1. Department of Mechanical Engineering, Minghsin University of Science and Technology, Hsinchu, Taiwan., 2. Department of Semiconductor and Electro-Optical Technology, Minghsin University of Science and Technology, Hsinchu, Taiwan., 3. Department of Electronic Engineering, Minghsin University of Science and Technology, Hsinchu, Taiwan.)
[P3-24]Room-temperature epitaxial growth of (ZnO)x(InN)1-x films on ScAlMgO4 by magnetron sputtering
*Ryota Narishige1, Naoto Yamashita1, Kunihiro Kamataki1, Takamasa Okumura1, Kazunori Koga1, Masaharu Shiratani1, Naho Itagaki1(1. Kyushu University)
[P3-25]Inverted Stranski-Krastanov growth of ZnO films on sapphire substrates with wurtzite MgO monolayers by sputtering
*Takafumi Yunoue1, Takamasa Usami2, Michihiro Yamada2, Kotaro Yataka1, Hiroki Otsuyama1, Naoto Yamashita1, Kohei Hamaya2, Naho Itagaki1(1. Kyushu University, 2. Osaka University)
[P3-26]Formation of AlCrN film by using Filtered Arc Deposition with anode focusing and cathode spot control
*Mirano Oneda1, Jumpei Kito1, Seiya Watanabe1, Genki Sano1, Takahiro Bando1, Hirofumi Takikawa1, Hiroaki Sugita2, Takahiro Hattori2, Hiroki Gima2(1. Toyohashi University of Technology, 2. OSG Co., Ltd., Research & Development Center)
[P3-27]Evaluating the Electrical Performance of Single Vanadium Redox Flow Battery
*Kira Magali Franco Davalos1, Alejandro Jesus Gorostiaga Tippach1, Bruno Nicolás Sánchez Acosta 1, Clara Celia Thielmann1, Feng-Li Tea2, Yu-Lin Kuo2(1. Taiwan-Paraguay Polytechnic University , 2. Department of Mechanical Engineering National Taiwan University of Science and Technology )
[P3-28]Time-resolved analysis of gas temperature in high-power pulsed hollow cathode discharge of Ti in Ar atmosphere by plasma emission spectroscopy
*Kosei Kikuchi1, Keiichi Takizawa1, Kanta Mori1, Robert Boyd2, Sebastian Ekeroth2, Ulf Helmersson2, Nikolay Britun3, Tetsuhide Shimizu1(1. Tokyo Metropolitan University, 2. Linköping University, 3. Nagoya University)
[P3-29]Preparation of Ru and Hf thin films by sputtering with different noble gas species
*Yamato Yokoyama1, Midori Kawamura1, Kazuhisa Suzuki1, Takayuki Kiba1(1. Kitami institute of technology)
[P3-30]The investigation of corrosion behavior of AlCoCrFeNi high entropy alloys in sea water using XPS, HAXPES and ToF-SIMS
*Pei-Chen Huang1,2,3, Ting-Jia Yang2, Man-Ying Wang1,2,3, Jing-Jong Shyue1,3, Wei-Chun Lin2(1. Department of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan., 2. Department of Photonics, National Sun Yat-sen University, Kaohsiung, Taiwan., 3. Research Center for Applied Sciences, Academia Sinica, Taipei, Taiwan.)
[P3-31]Study on the Process and Properties of Tantalum Yttrium Alloy
Films Deposited on Tungsten Steel as a Protective Layer
*Jian-Rong Chen1, Peng Kun Cheng1(1. Ming Chi University of Technology)
[P3-32]Analysis of adhesion structure between copper seed layer formed via medium-vacuum sputtering and cycloolefin polymer film
*Akihiro Shimizu1,2, Kazuhiro Fukada3, Shinichi Endo1, Shoko Kobayashi4, Koichi Higashimine4(1. Ushio Inc., 2. Gifu University, 3. Shibaura Machine Co., Ltd., 4. Japan Advanced Institute of Science and Technology)
[P3-33]Antimonene Nanofilms Deposited by Low-Power Magnetron Sputtering for Water Splitting Reaction
*Beng Kang TAY1(1. Centre for Micro- and Nano-Electronics (CMNE), School of Electrical and Electronic Engineering, Nanyang Technological University)
[P3-34]The Effect of Plasma Pretreatment for PP Non-Woven Graft-Polymerization Functional Hydrogel and Immobilization of Magnolol for Antibacterial Properties
Yu Jie Chen1, Chia Feng Hsieh2, *Shu-Chuan Liao1,2(1. Tamkang University, 2. DaYeh University)
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