[P3-03]Comprehensive characterization of Al2O3/SiOx/Si passivation layer for photovoltaics using nondestructive XPS and HAXPES techniques coupled with sputter technique
*Pei-Chen Huang1,2,3, Ting-Jia Yang2, Man-Ying Wang1,2,3, Jing-Jong Shyue1,3, Wei-Chun Lin2(1. Department of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan., 2. Department of Photonics, National Sun Yat-sen University, Kaohsiung, Taiwan., 3. Research Center for Applied Sciences, Academia Sinica, Taipei, Taiwan.)
