International Symposium on Sputtering & Plasma Processes (ISSP2024)

International Symposium on Sputtering & Plasma Processes (ISSP2024)

Jul 2 - Jul 5, 2024
International Symposium on Sputtering & Plasma Processes (ISSP2024)

International Symposium on Sputtering & Plasma Processes (ISSP2024)

Jul 2 - Jul 5, 2024

[P3-08]The influence of oxygen addition and post-deposition annealing on nanocrystalline GaN deposited by RF-sputtering

*Yuejie TAN1, Shinsuke Miyajima1(1. Tokyo Institute of Technology)