International Symposium on Sputtering & Plasma Processes (ISSP2024)

International Symposium on Sputtering & Plasma Processes (ISSP2024)

Jul 2 - Jul 5, 2024
International Symposium on Sputtering & Plasma Processes (ISSP2024)

International Symposium on Sputtering & Plasma Processes (ISSP2024)

Jul 2 - Jul 5, 2024

[P3-21]Effect of discharge pulse length on GaN thin films by high-density convergent plasma sputtering device

Itsuki Misono1, *Taisei Motomura2, Masato Uehara2, Tatsuo Tabaru2, Tetsuya Okuyama1,3(1. NIT, Kurume College, 2. AIST, 3. Kyushu Univ.)