International Symposium on Sputtering & Plasma Processes (ISSP)
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International Symposium on Sputtering & Plasma Processes (ISSP2024)
Jul 2
- Jul 5, 2024
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International Symposium on Sputtering & Plasma Processes (ISSP2024)
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International Symposium on Sputtering & Plasma Processes (ISSP2024)
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International Symposium on Sputtering & Plasma Processes (ISSP2024)
Jul 2
- Jul 5, 2024
[P3-21]
Effect of discharge pulse length on GaN thin films by high-density convergent plasma sputtering device
Itsuki Misono
1
, *Taisei Motomura
2
, Masato Uehara
2
, Tatsuo Tabaru
2
, Tetsuya Okuyama
1,3
(1. NIT, Kurume College, 2. AIST, 3. Kyushu Univ.)
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