International Symposium on Sputtering & Plasma Processes (ISSP2024)

International Symposium on Sputtering & Plasma Processes (ISSP2024)

Jul 2 - Jul 5, 2024
International Symposium on Sputtering & Plasma Processes (ISSP2024)

International Symposium on Sputtering & Plasma Processes (ISSP2024)

Jul 2 - Jul 5, 2024

[P3-23]Low-k Dioxide Layer Synthesized on pristine Si wafer

*Pei-Cheng Jiang1, Yu-Ting Chow2, Cheng-Hsun-Tony Chang3(1. Department of Mechanical Engineering, Minghsin University of Science and Technology, Hsinchu, Taiwan., 2. Department of Semiconductor and Electro-Optical Technology, Minghsin University of Science and Technology, Hsinchu, Taiwan., 3. Department of Electronic Engineering, Minghsin University of Science and Technology, Hsinchu, Taiwan.)