International Symposium on Sputtering & Plasma Processes (ISSP2024)
Jul 2 - Jul 5, 2024
International Symposium on Sputtering & Plasma Processes (ISSP2024)
Jul 2 - Jul 5, 2024
[P3-26]Formation of AlCrN film by using Filtered Arc Deposition with anode focusing and cathode spot control
*Mirano Oneda1, Jumpei Kito1, Seiya Watanabe1, Genki Sano1, Takahiro Bando1, Hirofumi Takikawa1, Hiroaki Sugita2, Takahiro Hattori2, Hiroki Gima2(1. Toyohashi University of Technology, 2. OSG Co., Ltd., Research & Development Center)