International Symposium on Sputtering & Plasma Processes (ISSP2026)
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Session Details

Oral Presentation6.Applied Research and Industrial Applications

Oral Session AP1

Fri. Jul 3, 2026 8:40 AM - 10:20 AM JST
Fri. Jul 3, 2026 11:40 PM - 1:20 AM UTC
Oral(Science Hall)
8:40 AM - 9:20 AM JST(11:40 PM - 12:20 AM UTC)

[AP1-01]Interconnect technologies for beyond 2nm integration

*Kazuyoshi Ueno1,2, Fumihiro Inoue1,2 (1. Yokohama National University, 2. Leading-edge Semiconductor Technology Center)
9:20 AM - 9:40 AM JST(12:20 AM - 12:40 AM UTC)

[AP1-02]Process Window of Plasma-Induced Hydrogen Engineering via SiOx Reservoir on Sputtered IGZO

*Hee Yeon Noh1, Haripriya G. R.1, Myoung-Jae Lee1, Hyeon-Jun Lee1 (1. DGIST)
9:40 AM - 10:00 AM JST(12:40 AM - 1:00 AM UTC)

[AP1-03]Wafer-scale epitaxial growth of high-piezoelectric single-crystal AlN films on Si substrates with an oxide buffer layer

*Azusa N. Hattori1, Osamu Nakagawara1, Kenji Ogata1 (1. I-PEX Piezo Solutions Inc.)
10:00 AM - 10:20 AM JST(1:00 AM - 1:20 AM UTC)

[AP1-04]Plasma simulation for PVD processes

*Masaaki Matsukuma1 (1. Tokyo Electron Technology Solution Limited)
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