2019 Fall Annual(165th) Meeting
Sep 11 - Sep 13, 2019Okayama University Tsushima Campus
2019 Fall Annual(165th) Meeting
Sep 11 - Sep 13, 2019Okayama University Tsushima Campus
[KJS14]Directly Assembled 3D Molybdenum Disulfide on Silicon Wafer for Efficient Photoelectrochemical Water Reduction
Gangtae Jin1, Chang-Soo Lee1, Dinsefa Mensur Andoshe2, Ho Won Jang2, *Moon-Ho Jo1(1. Pohang University of Science and Technology (POSTECH), Korea、2. Seoul National University, Korea)
By controlling the gas phase kinetics during metal–organic chemical vapor deposition, wafer-scale direct synthesis of 3D MoS2 films on TiO2-coated p-type Si substrates is demonstrated. The 3D MoS2 layer with a number of edge sites exposed to ambient substantially reduces the HER overpotential of Si photocathode and simultaneously increases the saturation current density due to the antireflection effect. Directly grown 3D MoS2 thin films are stable under extended water reduction duration.