Presentation Information
[S1.3]Properties of PtN2 film grown on Al2O3 substrate under ultra-high pressure
*Ken NIWA1, Tomoki IIZUKA1, Masashi KUROSAWA1, Yuto NAKAMURA1, Hideo KISHIDA1, Osamu NAKATSUKA1, Takuya SASAKI1, Nico Alexander GAIDA1, Masashi HASEGAWA1 (1. 名大院工)
Keywords:
超高圧合成,白金族窒化物,半導体
超高圧下(50万気圧下)でPtN2を単結晶サファイア基板上に成膜しその性状および電子物性を調べた.
