Presentation Information
[8p-P05-5]Control of Onset Potential by NiFeOx Cocatalysts on BiVO4 Photoelectrode
〇(M1)Shoya Asakura1, Yuta Sato1, Lingga oktariza1, Takeaki Sakurai1, Kenzi Yoshino2, Koichi Yoshiyama2, Higashi Tomohiro2 (1.Tsukuba Univ., 2.Miyazaki Univ.)
Keywords:
photocatalyst,co-catalyst
To improve the photoelectrochemical (PEC) performance of BiVO4-based photoanodes for water splitting, we investigated the influence of NiFeOx cocatalyst layers deposited by different methods on Mo-doped BiVO4 (Mo:BiVO4) thin films fabricated via RF sputtering. NiFeOx was deposited using three methods: dip-coating, drop-casting, and spin-coating. X-ray photoelectron spectroscopy (XPS) revealed that the oxidation states of Fe and Ni vary depending on the deposition method. PEC measurements showed that the dip-coated sample exhibited the highest photocurrent density and the lowest onset potential. Ultraviolet photoelectron spectroscopy (UPS) revealed a clear correlation between surface band bending and onset potential, indicating that the deposition method affects the surface electronic structure through changes in the oxidation state and Fermi level position of NiFeOx. Synchrotron-based XAFS measurements are planned to further investigate the local structure and electronic states at the NiFeOx/Mo:BiVO4interface.