[A5-O102] Oral 102

5:15 PM - 5:30 PM JST(8:15 AM - 8:30 AM UTC)

[A5-O102-10] Hydrogen gas barrier properties of amorphous SiO₂, SiN_x and Al₂O₃ films evaluated using gasochromism of Pd-loaded amorphous WO₃ films

*Taiga Kurihara¹, Mao Suzuki¹, Minseok Kim¹, Yuzo Shigesato¹ (1. Aoyamagakuin Univ. (Japan))

Keywords:

Hydrogen gas barrier properties,SiO2,SiNx,Al2O3,WO3,gasochromism