[G5-O201] Oral 201

10:30 AM - 10:50 AM JST(1:30 AM - 1:50 AM UTC)

[G5-O201-03] Influence of thermal energy on the formation of lattice strain in VO₂ thin films on TiO₂(001)

*Yuji Muraoka¹, Reki Nakamoto², Hiroyuki Okazaki³, Takanori Wakita¹, Takayoshi Yokoya¹ (1. Okayama Univ., RIIS (Japan), 2. Okayama Univ., Grad. Sch. Nat. Sci. Tech. (Japan), 3. QST (Japan))

Keywords:

VO2 film,Lattice strain,Laser fluence,PLD,TiO2 substrate