[H4-O401] Oral 401

10:20 AM - 11:00 AM JST(1:20 AM - 2:00 AM UTC)

[H4-O401-01] Plasma Processing Designed by Entropy-Based Approaches

*Osamu Sakai¹, Tsuyohito Ito², Makoto Kambara³, Tomoyuki Murakami⁴, Manabu Tanaka⁵, Satoshi Hirayama¹ (1. The University of Shiga Prefecture (Japan), 2. The University of Tokyo (Japan), 3. Osaka University (Japan), 4. Seikei University (Japan), 5. Kyushu University (Japan))

Keywords:

Plasma,Entropy,Phase space,Material processing