[H4-O402] Oral 402

4:30 PM - 4:50 PM JST(7:30 AM - 7:50 AM UTC)

[H4-O402-10] Machine Learning Prediction of Thin Film Property from Optical Emission Spectroscopy in Plasma Enhanced Chemical Vapor Deposition

*Kunihiro KAMATAKI¹, Sukma Wahyu Fitriani¹, Yushi Sato¹, Yosei Kurosaki¹, Tsukasa Masamoto¹, Kazunori Koga¹, Masaharu Shiratni¹ (1. Kyushu Univ. (Japan))

Keywords:

plasma process,machine learning,PECVD