Materials Research Meeting 2025 (MRM2025)
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Session Details

Oral SessionG. Advanced Materials and Emerging Technologies for Device Development : [G-5]Synthesis and applications of phase transition oxide films

[G5-O202]Oral 202

Wed. Dec 10, 2025 2:00 PM - 5:30 PM JST
Wed. Dec 10, 2025 5:00 AM - 8:30 AM UTC
Session 5(G316)
Chair:Yuji Muraoka(Okayama University), Md. Suruz Mian(Tokai University)
2:00 PM - 2:30 PM JST(5:00 AM - 5:30 AM UTC)

[G5-O202-01]Control of Metal-Insulator Transition using Resonant Tunneling in Oxide Double Quantum-Well Structures

*Hiroshi KUMIGASHIRA1 (1. IMRAM, Tohoku University (Japan))
2:30 PM - 2:50 PM JST(5:30 AM - 5:50 AM UTC)

[G5-O202-02]Tuning the Transition Temperature of VO2 Films via Applied Stress

*Junjun JIA1, Shyun ANDO2, Yuzo SHIGESATO2 (1. Waseda University (Japan), 2. Aoyama Gakuin University (Japan))
2:50 PM - 3:10 PM JST(5:50 AM - 6:10 AM UTC)

[G5-O202-03]Vanadium dioxide Based Smart Thermal Emitters Exhibiting High Transparency in the Visible Spectrum

*Kazutaka Nishikawa1, Kenichi Yatsugi1 (1. Toyota Central R&D Labs., Inc. (Japan))
3:10 PM - 3:30 PM JST(6:10 AM - 6:30 AM UTC)

break

3:30 PM - 3:50 PM JST(6:30 AM - 6:50 AM UTC)

[G5-O202-04]Preparation of Epitaxial EuNiO3 thin films towards high-speed proton diffusion phenomena

*Kenta Nakanishi1, Hidekazu Tanaka1,2,3,4, Haobo Li1,2,3,4 (1. University of Osaka (Japan), 2. SANKEN (Japan), 3. Spintronics Research Network Division (Japan), 4. OTRI (Japan))
3:50 PM - 4:10 PM JST(6:50 AM - 7:10 AM UTC)

[G5-O202-05]Layer-Selective Observation of Collective Phase Transition in VO2-Based Heterostructures by in situ Photoemission Spectroscopy

*Daisuke Shiga1, Seitaro Inoue1, Tatsuhiko Kanda1, Naoto Hasegawa1, Miho Kitamura2, Koji Horiba2, Kohei Yoshimatsu1, Andrés F. Santander-Syro3, Hiroshi Kumigashira1,2 (1. Tohoku Univ. (Japan), 2. KEK (Japan), 3. Paris-Saclay Univ. (France))
4:10 PM - 4:30 PM JST(7:10 AM - 7:30 AM UTC)

[G5-O202-06]Strain-Driven Control of the Metal–Insulator Transition in Oriented Perovskite Manganite Thin Films: A Platform for Oxide Thermoelectric Engineering

*Tomohiko Nakajima1, Masayuki Fukuda1, Yuuki Kitanaka1 (1. National Institute of Advanced Industrial Science and Technology (Japan))
4:30 PM - 5:30 PM JST(7:30 AM - 8:30 AM UTC)

Time adjustment

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