[16en] Energy & Electronics

2:40 PM - 3:00 PM JST(5:40 AM - 6:00 AM UTC)

[16en-02] Exploring aligned CNT material for device application: variability and polymer cleaning

*Marina Y. Timmermans¹, Luca Mana^1,2, Himanshu Sharma¹, Dennis Lin¹, Jean-François de Marneffe¹, Patrick Kelp¹, Atefeh Fathzadeh^1,2, Philippe Bezard¹, Xiangyu Wu¹, Han Han¹, Lijun Liu^1,2, Katherine R. Jinkins³, Michael S. Arnold³, Claudia Fleischmann^1,2, Steven Brems¹, Cesar J. L. de la Rosa¹, Gouri S. Kar¹ (1. imec (Belgium), 2. KU Leuven (Belgium), 3. SixLine Semiconductor (United States of America))

Keywords:

aligned CNT material,polymer removal,transient-assisted plasma etching,alignment variability