Presentation Information
[YD01]Characterization and Formation Mechanism of Sublimable Films During Sublimation Drying Process
*Chen Kuang1, Ryuta Tsukahara1, Hiroyuki Fukue1, Sosuke Hori1, Naoya Torikai2 (1. SCREEN Semiconductor Solutions Co., Ltd. (Japan), 2. Mie University (Japan))
Keywords:
Sublimable films,Pattern collapse,X-ray reflectivity
