Short wavelength light sources and applications (2)

1:45 PM - 2:15 PM JST(4:45 AM - 5:15 AM UTC)

[ALPS-E2-02(Invited)] Intense Extreme Ultraviolet and Vacuum Ultraviolet Radiation Sources for Controlling of Material Surface Contamination

*Nozomi Tanaka¹, James Edward Hernandez¹, Yubo Wang¹, Jijun Zhong¹, Yulin Gong¹, K. Nishihara^1,2, A. Sunahara^1,3, T. Johzaki^1,4, Kyung Sik Kang⁵, S. Ueyama⁶, S. Fujioka^1,7 (1. Osaka University, 2. Osaka Metropolitan University, 3. Purdue University, 4. Hiroshima University, 5. Samsung Electronics Co.Ltd., 6. Samsung Japan Corporation, 7. National Institute for Fusion Science)

We investigated hydrogen radical production in photoionized hydrogen plasma using an intense pulsed XUV source. Laser-induced fluorescence measurements revealed a hydrogen radical density of 4 x 10⁴ cm^-3. Enhanced radical production via longer-wavelength vacuum ultraviolet emission is proposed for efficient EUV mirror cleaning.