Optics (III)

11:20 AM - 11:35 AM JST(2:20 AM - 2:35 AM UTC)

[XOPT8-01] Development of an etching technique using atmospheric pressure plasma to realize a distortion-free Ge channel-cut crystal monochromator

*Masafumi Miyake¹, Shotaro Matsumura¹, Iori Ogasahara¹, Taito Osaka², Jumpei Yamada¹, Daisetsu Toh¹, Kazuto Yamauchi³, Makina Yabashi^2,4, Yasuhisa Sano¹ (1. Graduate School of Engineering, Osaka University, 2. RIKEN SPring-8 Center, 3. Osaka University-RIKEN Center for Science and Technology, Osaka University, 4. Japan Synchrotron Radiation Research Institute)

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