Presentation Information
[XOPTp-16]Surface finishing of a micro channel-cut crystal monochromator for self-seeding using high-pressure plasma etching
*Ryuji Oda1, Masafumi Miyake1, Shotaro Matsumura1, Taito Osaka2, Makina Yabashi2,3, Kazuto Yamauchi4, Jumpei Yamada1, Daisetsu Toh1, Yasuhisa Sano1 (1. Osaka University, 2. RIKEN SPring-8 Center, 3. JASRI, 4. Osaka University-RIKEN Center for Science and Technology)
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