Presentation Information
[ALPSp2-13]Efficient Residual Stress Relaxation of SiC Using Ultraviolet Nanosecond Lasers
*Hsin-Yi Tsai1,2, J. Andrew Yeh2, Kuo-Cheng Huang1, Ching-Hsueh Chiu3 (1. National Center for Instrumentation Research, National Institutes of Applied Research, 2. Department of Power Mechanical Engineering, National Tsing Hua University, 3. Department of Electronic Engineering, Chung Yuan Christian University)
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