XOPT Poster Session

[XOPTp-28] Surface finishing of a Ge micro channel-cut crystal monochromator for self-seeding using high-pressure plasma etching

*Ryuji Oda¹, Masafumi Miyake¹, Shotaro Matsumura¹, Iori Ogasahara¹, Taito Osaka², Kazuto Yamauchi⁴, Makina Yabashi^2,3, Yasuhisa Sano¹ (1. The University of Osaka, 2. RIKEN SPring-8 Center, 3. JASRI, 4. The University of Osaka-RIKEN Center for Science and Technology)