Presentation Information
[P1-67]Sputtered high-coercivety CeCo thin film on glass substrate
Cheng-Yan Lee2, Sea-Fue Wang2, Huang-Wei Chang3, *An-Cheng Aidan Sun1 (1. Yuan Ze University (Taiwan), 2. National Taipei University of Technology (Taiwan), 3. National Chung Cheng University (Taiwan))
Keywords:
CeCo,Thin Film,Magnetic
CeCo permanent magnetic materials have been widely studied in bulk, powder, and ribbon forms. However, their thin-film counterparts remain relatively unexplored. To expand the application of CeCo permanent magnetic materials in MEMS, sensors, and magnetic recording devices, it is essential to develop CeCo thin films with optimized magnetic properties. Sputtering is a promising fabrication method due to its compatibility with mass production and ability to produce thin films with high coercivity and magnetization. However, reports on the successful sputtering of CeCo thin films with high magnetic performance remain limited.
In this study, high-coercivity CeCo thin films were deposited on glass substrates using a sputtering system with a CeCo alloy target. The base pressure was maintained below 5×10-7 Torr, and the argon working pressure was set at 10 mTorr. The thin films were deposited at room temperature using RF sputtering at 100 W, followed by rapid thermal annealing at 400°C for 10 minutes. The phase structure and magnetic properties were analyzed using X-ray diffraction (XRD) and vibrating sample magnetometry (VSM).
The results confirmed that the CeCo thin films exhibited high coercivity in both in-plane (Hc//=9000 Oe) and out-of-plane (Hc⊥=7000 Oe) directions, along with a saturated magnetization (Ms) of approximately 320 emu/cm3. The initial magnetization curve indicated that coercivity was initially dominated by domain wall motion, followed by a combination of domain wall motion and rotation mechanisms. Additionally, the shoulder-like feature near the zero-field range suggested the presence of a minor soft magnetic phase, likely due to insufficient thermal energy during the annealing process.
Future investigations will focus on further characterizing the microstructure and magnetic properties of sputtered CeCo thin films to optimize their performance for potential applications.
In this study, high-coercivity CeCo thin films were deposited on glass substrates using a sputtering system with a CeCo alloy target. The base pressure was maintained below 5×10-7 Torr, and the argon working pressure was set at 10 mTorr. The thin films were deposited at room temperature using RF sputtering at 100 W, followed by rapid thermal annealing at 400°C for 10 minutes. The phase structure and magnetic properties were analyzed using X-ray diffraction (XRD) and vibrating sample magnetometry (VSM).
The results confirmed that the CeCo thin films exhibited high coercivity in both in-plane (Hc//=9000 Oe) and out-of-plane (Hc⊥=7000 Oe) directions, along with a saturated magnetization (Ms) of approximately 320 emu/cm3. The initial magnetization curve indicated that coercivity was initially dominated by domain wall motion, followed by a combination of domain wall motion and rotation mechanisms. Additionally, the shoulder-like feature near the zero-field range suggested the presence of a minor soft magnetic phase, likely due to insufficient thermal energy during the annealing process.
Future investigations will focus on further characterizing the microstructure and magnetic properties of sputtered CeCo thin films to optimize their performance for potential applications.
