[Session 5] Session 5: Atomistic/Ab-initio Modeling

11:10 AM - 11:30 AM JST(2:10 AM - 2:30 AM UTC)

[Session_5-06] Thickness-Dependent Conductivity Scaling of B20-Type Chiral Topological Semimetals for Beyond-Cu Interconnect Applications

*Sukhyeong Youn¹, HyeukJin Han², Jiwon Chang¹ (1. Yonsei Univ., 2. Sungshin Women’s Univ.)