SISPAD2026
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Session Details

Workshop

[Workshop A]Part A / Process Simulation

Sun. Sep 27, 2026 9:30 AM - 12:40 PM JST
Sun. Sep 27, 2026 12:30 AM - 3:40 AM UTC
Kumamoto City International Center (6th floor)
9:30 AM - 9:40 AM JST(12:30 AM - 12:40 AM UTC)

[WS-OP]Opening

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9:40 AM - 10:20 AM JST(12:40 AM - 1:20 AM UTC)

[A-1]Overview of Integrated Plasma Reactor and Feature Scale Modeling: Algorithms and Applications to Cryogenic Etching

Mark J. Kushner (University of Michigan)
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10:20 AM - 11:00 AM JST(1:20 AM - 2:00 AM UTC)

[A-2]Optimal Design of MOCVD Process for AlGaN/AlN Deep-Ultraviolet Laser Diodes: Ab Initio-Based Approach

Yoshihiro Kangawa (Kyushu University)
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11:20 AM - 12:00 PM JST(2:20 AM - 3:00 AM UTC)

[A-3]Process Topography TCAD for Advanced Manufacturing

Lado Filipovic (Vienna University of Technology)
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12:00 PM - 12:40 PM JST(3:00 AM - 3:40 AM UTC)

[A-4]Multiscale Modeling of SiGe-based Device Processing

Yury Shustrov (STR Software)
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